US 4,902,605 : Photoresist composition comprising cyclohexyleneoxyalkyl acrylates


Inventors:
Klein, Gerald W. (Pittsford, NY)
Mcconkey, Robert C. (Rochester, NY)
Molaire, Michel F. (Rochester, NY)
Noonan, John M. (Rochester, NY) 
Assignee:
Eastman Kodak Company (Rochester, NY) 

A flexible and nonbrittle negative-working photoresist composition comprises a polymeric binder, a photoinitiator composition, and a polymerizable cyclohexyleneoxyalkyl acrylate monomer characterized by the structural formula: ##STR1## wherein R is H or CH3,

a is an integer of from 1 to 10 and

b is 1 or 2.

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